To allow real-time control of dielectric chemical mechanical planarization (CMP) processes to the 45 nm device node and beyond, Santa Clara, Calif.-based semiconductor manufacturing equipment leader ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today announced the shipment of its 2,500 th CMP 1 system, marking a major milestone in the industry and ten consecutive years of CMP ...
SANTA CLARA, USA: Applied Materials Inc. announced its new Applied FullVision System that enables real-time control of dielectric CMP1 processes to the 45nm device node and beyond. The FullVision ...
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